Sputtering Taget & Evaporation Materials

We offer Sputtering target on backing plate for PVD,ARC & Magnatron Machines.
We provide one of the largest, most comprehensive lines of sputtering target materials. All popular geometries (and sizes) including rings, S-Guns and circular, rectangular and triangular and planar targets are available. Most sputtering target materials can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or bevelled joints.
Pure MetalsOxidesCompounds/ AlloysBoridesCarbidesFluoridesNitridesSelenidesSilicidesSulphidesTelluridesTarget Bonding
ceramic, metal, alloy targets and various other special material targets. After several years of technology accumulation, it has core technologies such as plasma spraying, ceramic sintering, and vacuum melting. The company provides a complete set of equipment and technology for sputtering targets, plasma spraying and casting rotating targets, and also undertakes processing services such as arc and ion spraying surface treatment.Application:PVD Multi ARC & Magnetron Coating machines

• Item Code: iSPURT
• Production Capacity: 10000
• Delivery Time: 15 days